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enhancementNew feature or requestNew feature or request
Description
Instead of specifying geometries "as fabricated", it should be doable to "emulate" process fabrication. This is not as good as physical process simulation, but can be appealing.
- substrate
- GMSH box
- size defines process domain in x, y, z
- masked conformal growth/deposition of thickness t
- create a new entity by
occ.fuseall existing entities - masking:
occ.cutvertically across the domain where the mask covers the substrate - apply
occ.dilateon the entity by the desired thickness (isotropicallya=b=c=tor directionally e.g.a=b=0,c=t; other types of growth at other angles also possible) - if isotropic,
occ.filletthe dilated entity's curves byradii = t; this will maintain a distance of t from the previous surface everywhere occ.cutby the originalocc.fuse: this also allows tagging of the new grown layer
- create a new entity by
- masked etching
- full overetch hack:
occ.cutthe tag of a grown layer by an infinitely tall box (or other shape if isotropic or non-vertical anisotropy) with x-y dimensions matching mask opening - otherwise can
occ.cutwith a grown gas layer (complement of current fuse with process domain) where exposed
- full overetch hack:
- alternate depositions and etches as needed
- cleanup
occ.cutoutside the process domain in x,y
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enhancementNew feature or requestNew feature or request